Xenon oxydifluoride is an inorganic compound with the molecular formula XeOF2. The first definitive isolation of the compound was published on 3 March 2007, producing it by the previously-examined route of partial hydrolysis of xenon tetrafluoride.[1]
- XeF4 + H2O → XeOF2 + 2 HF
The compound has a T-shaped geometry and does not form polymers, though it does form an adduct with acetonitrile and with hydrogen fluoride.[1]
Although stable at low temperatures, it rapidly decomposes upon warming, either by losing the oxygen atom or by disproportionating into xenon difluoride and xenon dioxydifluoride:[1]
- 2 XeOF2 → 2 XeF2 + O2
- 2 XeOF2 → XeF2 + XeO2F2
Xenon oxytetrafluoride (XeOF4) is primarily used as a powerful oxidizing agent in organic synthesis and fluorination reactions. It is also used in the semiconductor industry for etching silicon surfaces and in the production of specialty chemicals. Additionally, it has potential applications in the field of materials science and as a reagent in chemical research.
References
- ^ a b c Brock, David S.; Bilir, Vural; Mercier, Hélène P. A.; Schrobilgen, Gary J. (2007). "XeOF2, F2OXeN≡CCH3, and XeOF2·nHF: Rare Examples of Xe(IV) Oxide Fluorides". Journal of the American Chemical Society. 129 (12): 3598–3611. doi:10.1021/ja0673480. PMID 17335282.
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